Seminář projektu Rozvoj řešitelských týmů projektů VaV na Technické univerzitě v Liberci Registrační číslo projektu: CZ.1.07/2.3.00/30.0024
Fakulta strojního inženýrství - VUT v Brně Nejen ozubená kola fotony, plazmony, elektrony, atomy, ionty Stanislav Průša 10. 12. 2013
Optika a přesná mechanika Fyzika povrchů a tenkých vrstev Mikromechanika materiálů a akustika
Fyzikální inženýrství a nanotechnologie
Complex UHV apparatus for in situ characterization of surfaces, ultrathin films & nanostructures
clean rooms vacuum
Selective growth of nanostructures Detection of surface plasmon polaritons Functional properties of nanostructures CVD graphene Thin film deposition and characterisation
Selective growth of nanostructures Selective growth of metallic nanostructures (Au,..) from collodal solutions on prepatterned substrates M. Kolíbal et al, ACS Nano 6 (2012), 10098 Selectively grown low-temperature GaN (UHV) Ga deposition: T= 300 C, postnitridation (50 ev) : T= 300 C In situ montoring of the growth of Ge nanowires M. Kolíbal et al., APL 99 (2011) 143113 M. Kolíbal et al., APL 100, (2012), 203102
In-situ monitoring of Ge nanowire growth Ge(100) 20 nm Au colloids evaporation 0.5 nm/min Tilted image (52 )
Detection of surface plasmon polaritons FDTD simulation (Lumerical) Detection of surface plasmon polaritons by SNOM P. Dvořák et al., NANO LETTERS, 2013
Functional properties of nanostructures Switching the spin circulation of magnetic vortices by ultrafast current pulses V. Uhlíř et al., Nature Nanotechnology 8 (2013),341-346
Graphene based structures Raman spectra of a CVD graphene single domain on a Si substrate
LEIS Signal Studying the outermost surface of any material by LEIS 3 He +, 4 He +, Ne +, Ar + 1-8 kev Detector for Energy of Ions θ 3 1 2 E f = f (M 1, M 2, M 3, θ) * E i Energy atomic mass 2 3 1 Energy Atomic composition of outermost atomic layer No matrix effects In-depth (0 10 nm) (non-destructive) Energy 1 8 kev Lateral resolution 0.01 1 mm
Yield (cts/nc) Surface specific information Sample as is shows large background and O peak Heating reduces background, removes O x10 0 4.0 3.0 2.0 C as is after 5 min @ 400 ⁰C after 5 min @ 400 ⁰C, ToF filter O ToF filtered LEIS fully removes background Outer surface: only carbon continuous film! 1.0 0.0 500 1000 1500 2000 2500 Energy (ev)
Yield (cts/nc) Identification of sub-surface contaminants x10 1 In-depth signal of at least one heavy element contamination below graphene layer 3.0 O 3 kev He scattering after 3E15 ions/cm 2 500 ev Ar Na Slight sputtering brings element to the surface for identification Contamination by Na, V, Fe, and Sn below graphene 2.0 1.0 Si Fe Sn improved preparation method reduced contamination significantly 0.0 1000 1500 2000 2500 Energy (ev)
New major projects: Projects and field of cooperation Advanced Microscopy and Spectroscopy Platform for Research and Development in Nano and Microtechnologies AMISPEC, Czech Technology Agency (2012 2019), 2 mil. EUR (coordinator: BUT, total: 12 mil. EUR), companies involved: Tescan, ON SEMI, Optaglio Universal SEM as a multi-nano-analytical tool - UnivSEM, SME-targeted Collaborative Project, FP7-NMP-2011-SME-5 (2012 2014), 0.7 mil. EUR, companies involved: Tescan, SPECS, WITec SYLICA, FP7 Capacities (2011 2014), Mobility programme, cooperation between Life & Materials Sciences Participation in other International Projects welcome! Expertise and Potential Cooperation Areas: Physics and Engineering of Surfaces/Thin Films Fabrication and characterization of nanostructures (both vacuum and ambient methods) Development of scientific equipment and components for nanostructure fabrication and characterization
IPE BUT/CEITEC BUT- surface & thin film group Coworkers: Jan Čechal, Miroslav Kolíbal, Miroslav Bartošík, P. Bábor, Stanislav Průša, Stanislav Voborný, Jindřich Mach, David Škoda, Josef Polčák, Michal Potoček, Tomáš Matlocha, Zdeněk Nováček, Jan Neuman, Zuzana Bortlová, Tomáš Šamořil, Radek Kalousek, Jakub Zlámal, Petr Dub, Ondra Tomanec, Libor Šuster, Lukáš Břínek, Michal Kvapil, Michal Urbánek, Jiří Spousta, Vojtěch Uhlíř, Libuše Dittrichová, P. Varga,...